Xpress PE-Kleen

• The new filter rated as sub 1 nm is constructed of ultra-high purity, high density polyethylene (HDPE) media and high-density polyethylene (HDPE) hardware materials.
• HDPE is a high-performance material known for its superior hard particle removal, making it ideal for most chemicals used in the advanced lithography processes including leading edge EUV resist materials.  It offers a significant improvement in cleanliness and particle removal over traditional lithographic filter materials.
• The new high flow sub -1 nm PE-Kleen filter is an additional tool for advanced lithographers to use in their defectivity reduction strategies.
• The new high flow sub 1 nm PE-Kleen filter undergoes Pall’s Xpress cleaning process, which results in superior metal, organic and particulate cleanliness, specifically designed for the most advanced patterning chemistries.
• The combination of high flow, the finest removal rating and the Xpress cleaning results in a superior defect reducing filter combination.

New, High Flow Sub 1 nm Rated High Density Polyethylene (HDPE) Filters