Pall PTFE Membrane Technology Innovation
- > 50% improvement in on wafer defects over previous generation products
- Optimized flow performance using proprietary technology improved startup time by >50% compared to previous generation products
- Removal of NVR, particles ( >20 nm), anions, and TOC from filter surfaces due to innovative post manufacturing cleaning process
- Optimized for use with Sulfuric Acid, IPA and Pure Chemicals
- All fluoropolymer materials made without PFOA
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